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有读书笔记有附件A novel two-step MOCVD for producing thin copper films with a mixture of ethyl alcohol and water as the additive

热2 zsbird1223 添加于 2010-6-10 15:14 | 2905 次阅读 | 1 个评论

  •  作 者

    Hsin-Hung Lee, Chiapyng Lee, Yu-Lin Kuo, Yee-Wen Yen

  •  摘 要

    The feasibility of using a novel metal-organic chemical vapor deposition (MOCVD) technique to achieve the deposition of a smooth, continuous, and conformal copper (Cu) film on the TaN substrate was examined. This method consists of two consecutive steps: an oxide deposition step followed by a reduction step. In the oxide deposition step, cuprous oxide (Cu2O) is deposited with Copper(II)-1,1,1,5,5,5- hexafluoroacetylacetonate hydrate (Cu(hfac)2IxH2O) as the precursor and a mixture of ethyl alcohol and water as the additive. In the reduction step, the preformed Cu2O thin film is reduced to an elemental copper metal film through exposure to ethyl alcohol. Experimental results indicate that the proposed two-step MOCVD method succeeds in forming smooth, continuous, and conformal copper films. The grain size and roughness of these copper films are ranging from 30 to 94 nm and from 1.12 to 6.33 nm, respectively. Therefore, this technique may potentially be used as high-quality seed layers for electroplating.

  •  详细资料

    • 文献种类:期刊
    • 期刊名称: Thin Solid Films
    • 期卷页: 第498卷 43-49页
    • 研究机构: National Taiwan University of Science and Technology, Taiwan

  •  标 签

    课题相关一星  兴趣一星  期刊影响两星  CVD  film 

  •  附 件

    PDF附件A novel two-step MOCVD for producing thin copper films with a mixture of ethyl alcohol and water as the additive 

  •  zsbird1223 的文献笔记  订阅

    使用较复杂的一种前驱体（看样子前驱体的选择还是CVD的一个限制），先沉积制备了氧化铜，然后利用乙醇热解产生的氢气来进行还原，制备了铜薄膜。问题1：为什么要使用乙醇来产生氢气，而不直接使用氢气，因为活性问题么？文献报道有使用氢气作为还原剂，但发现产物薄膜的孔隙率和粗糙表面不适合作为晶种层。后期有人使用乙醇和异丙醇来作为还原剂，但发现仅能提高沉积速率，对质量改进没有帮助。所以，采用了两步法来沉积。实验证明这种方法有利于制备光滑，连续及coformal的铜薄膜。

     

     

    2.用途：本文主要用于沉积薄膜作为晶种来进一步电镀，利用铜的低电阻率和较高的电子迁移阻力（和铝及铝合金相比），来制备deep submicron ultralarge scale integrated (ULSI) circuits（呃，不懂）。

     

     

     

     

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