Universal Segregation Growth Approach to Wafer-Size Graphene from Non-Noble Metals
作 者 摘 要
Graphene has been attracting wide interests owing to its excellent electronic, thermal, and mechanical performances. Despite the availability of several production techniques, it is still a great challenge to achieve wafer-size graphene with acceptable uniformity and low cost, which would determine the future of graphene electronics. Here we report a universal segregation growth technique for batch production of high-quality wafer-scale graphene from non-noble metal films. Without any extraneous carbon sources, 4 in. graphene wafers have been obtained from Ni, Co, Cu−Ni alloy, and so forth via thermal annealing with over 82% being 1−3 layers and excellent reproducibility. We demonstrate the first example of monolayer and bilayer graphene wafers using Cu−Ni alloy by combining the distinct segregation behaviors of Cu and Ni. Together with the easy detachment from growth substrates, we believe this facile segregation technique will offer a great driving force for graphene research.
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