【原创】 本文主要研究了莲花自洁净效应以及表面疏水性。研究模型是smooth silicon surface containing staggered rhombus posts。 研究方法是使液滴在衬底表面滚动。 研究需要的理论:1、contact line advancing 和 receding 都需要克服kinetic barriers。从一个暂稳态到达另外一个暂稳态。These barriers 导致了contact line pinning and hysteresis。而且the process of receding has a greater activation energy than the process of advancing. 2、Cassie theory (Cassie, A. B. D. Contact angles. Disscuss. Faraday Soc. 1948, 3, 11.)认为液滴在多孔、多柱衬底上的接触角(Apparent contact angle)与占空比有关。该关系是通过计算系统总Gibbs free energy的最小化得出的。公式为cos(θ)=(1-f)cos(θY)+f cos(180º) . θY 是平整衬底的Young contact angle, 180º是液-气接触角,f 是占空比。可见占空比越大apparent contact angle越大。 3、疏水性取决于: a、advancing/receding contact angle之差,即contact angle hysteresis。 b、high advancing contact angle。 研究思路:利用Cassie theory 采用多柱衬底得到higer advancing contact angle;通过对柱顶的化学修饰增大 receding contact angle,以减小接触接 hysteresis 。最终达到了增加衬底疏水性的目的。最终结果为:柱顶修饰前接触角为:176/156,修饰后为 >176/>176。 修饰效果明显 文章的结论: 1、虽然平滑硅衬底的hysteresis为104/103. 但是疏水性小于文章中制备的多柱衬底。(advancing contact angle小) 2、作者很好地对莲花自洁净效应进行了biomimetic(仿生)。 3、The dual length-scale topography affects the kinetics of contact line recession by lowering the transition state energy between metastable states. 我对这段话的理解是:contact line pinning 效应越弱,drag reduction 越明显,疏水性越好。莲叶表面的pinning效应肯定非常不明显。 4、There is a thermodynamic effect in addition to this kinetic one that involves very different physics: the Laplace pressure at which water intrudes between the posts (这段话没看懂) 。For a given geometry (area and contact perimeter of a unit cell), the Laplace pressure is only a function of the advancing contact angle(-cos θA) . Increasing the Laplace pressure by a factor greater than 4. 5、从动力学角度进行drag reduction,即增加疏水性,是通过增大receding contact angle;从热力学角度增大疏水性是通过 Laplace pressure 的调制,即优化柱状拓扑结构。(作者对热力学方法的理解有误,参见疑问1) 疑问: 1、Cassie 理论有误 (参见 Effect of three-phase contact line topology on dynamic contact angles on heterogeneous furfaces) 2、Laplace pressure 与advaning contact angle 以及柱状拓扑结构的关系? |